The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2018

Filed:

Jul. 15, 2016
Applicant:

Nuflare Technology, Inc., Yokohama-shi, JP;

Inventor:

Nobuo Miyamoto, Yokohama, JP;

Assignee:

NuFlare Technology, Inc., Yokohama-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/06 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/06 (2013.01); H01J 37/3174 (2013.01); H01J 2237/022 (2013.01);
Abstract

In one embodiment, a method of cleaning an electron source included in an electron gun for an electron beam writing apparatus includes supplying an inert gas to an electron gun chamber, allowing the electron source to emit electrons, ionizing the inert gas with the electrons to produce ions, and removing contaminants deposited on the electron source by bombardment with the ions, and cutting off the supply of the inert gas based on a change in electron beam emission characteristic of the electron gun.


Find Patent Forward Citations

Miyamoto, Nobuo. (2018). Method of cleaning electron source and electron beam writing apparatus (U.S. Patent No. 10134559). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10134559

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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