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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10134522 B1

PDFFull Text
Date of Patent:
Nov. 20, 2018

Filed:

Feb. 17, 2016

Planar reactor

Applicant:

Cyntec Co., Ltd., Hsinchu, TW;

Inventors:

Wei Zhang, Shanghai, CN;

Chu-Keng Lin, Hsinchu, TW;

Hung-Chih Lin, Hsinchu, TW;

Hsieh-Shen Hsieh, Hsinchu, TW;

Assignee:

CYNTEC CO., LTD., Hsinchu, TW;

Attorney:

Winston Hsu

Primary Examiner:

Tsz Chan

Int. Cl.
CPC ...
H01F 27/08 (2006.01); H01F 27/10 (2006.01); H01F 27/02 (2006.01); H01F 17/00 (2006.01); H01F 17/06 (2006.01); H01F 27/24 (2006.01); H01F 27/34 (2006.01); H01F 27/29 (2006.01);
U.S. Cl.
CPC ...
H01F 27/341 (2013.01); H01F 27/29 (2013.01);
Abstract

A planar reactor includes a core and a coil. The core includes an upper board, a lower board and a pillar. The pillar is located between the upper board and the lower board. A winding space is located among the upper board, the lower board and the pillar. The coil is wound around the pillar and located in the winding space. The pillar and at least one of the upper board and the lower board are coplanar at a first side of the planar reactor. The pillar is sunk into the winding space from a second side of the planar reactor, wherein the first side is opposite to the second side. A first end of the coil is exposed from the first side of the planar reactor. A second end of the coil is hidden in the winding space partially or wholly at the second side of the planar reactor.

Find Patent Forward Citations

Zhang, Wei. (2018). Planar reactor (U.S. Patent No. 10134522). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10134522

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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