The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Dec. 29, 2015
Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai, CN;
Shuo Shi, Shanghai, CN;
Hanchuan Ji, Shanghai, CN;
Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai, CN;
Abstract
A self-damping shutter apparatus for use in an exposure system of a photolithography machine, comprising: at least two pieces of shutter blades () for cutting off light source to an exposure area when the shutter is closed; a shutter driving arm (), for driving the shutter blades () to synchronically open or close; a magnetic damping brake motor (), for driving or braking the shutter driving arm (), and the magnetic damping brake motor () drives and brakes, via the shutter driving arm (), the shutter blades (). The self-damping shutter apparatus for use in the exposure system of the photolithography machine increases consistency of opening or closing the shutter blades, improves a light shading effect of the shutter apparatus in an exposure, and improves stability in the process of opening or closuring the shutter blades. When the shutter blades complete actions of opening or closing, current is not needed, the magnetic damping braking motor enables the shutter blades to maintain the state of opening or closing, shortens duration of control current, reduces heat dissipation, and saves energy.