The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Aug. 26, 2015
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Takayuki Fujiwara, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Kenichi Oikawa, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); C08F 220/18 (2006.01); C08F 224/00 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
C08F 224/00 (2013.01); C08F 220/18 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0397 (2013.01); G03F 7/30 (2013.01); G03F 7/325 (2013.01);
Abstract
A resist composition comprising a polymer comprising recurring units of lactone and a PAG is provided. The resist composition has a high dissolution contrast during organic solvent development, and improved resist properties including MEF and CDU and forms a fine hole pattern with improved roundness and size control.