The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2018

Filed:

Jul. 20, 2017
Applicant:

Semiconductor Components Industries, Llc, Phoenix, AZ (US);

Inventors:

Ralph N. Wall, Pocatello, ID (US);

Meng-Chia Lee, Pocatello, ID (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/739 (2006.01); H01L 29/06 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/15 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0623 (2013.01); H01L 29/1095 (2013.01); H01L 29/158 (2013.01); H01L 29/66333 (2013.01); H01L 29/66712 (2013.01); H01L 29/7395 (2013.01); H01L 29/7802 (2013.01);
Abstract

A semiconductor device having a novel buried junction architecture. The semiconductor device may have three terminals and a drift region between two of the terminals. The drift region includes an upper drift layer, a lower drift layer, and a buried junction layer between the upper and lower drift layers, wherein the upper and lower drift layers have a first type of doping. The buried junction layer comprises an interspersed pattern of a first material and a second material, the first material having a second type of doping opposite the first type of doping and the second material having the first type of doping and having a different doping concentration than the upper and lower drift layers.


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