The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2018
Filed:
Feb. 18, 2016
Tokyo Electron Limited, Tokyo, JP;
Tsuyoshi Nogami, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
An operation amount for operating a flow rate control mechanism of a processing liquid can be appropriately adjusted based on a physical property of the processing liquid or a characteristic of a processing liquid supply mechanism while supplying the processing liquid. In a processing liquid supply device that supplies a processing liquid to a substrate, a processing liquid supply mechanism discharges the processing liquid toward the substrate via a flow rate control mechanism which controls the processing liquid based on an operation amount. A flow rate detection unit detects a flow rate of the processing liquid supplied to the substrate. A system identification unit determines a system parameter according to a system model of the processing liquid supply mechanism. A flow rate controller determines a new operation amount of the flow rate control mechanism by using the system parameter.