The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Jan. 05, 2017
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Jang Gn Yun, Hwaseong-si, KR;
Sun Young Kim, Seongnam-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A semiconductor device and a method of forming the same are provided. The semiconductor device includes interlayer support patterns sequentially stacked on a substrate, horizontal conductive patterns sequentially stacked on the substrate, and an interlayer insulating layer disposed between the interlayer support patterns, extending between the horizontal conductive patterns, and disposed in parallel with a surface of the substrate. The interlayer insulating layer is in contact with the interlayer support patterns. A conductive structure extends in a direction perpendicular to the substrate. Vertical structures extending through the horizontal conductive patterns and the interlayer insulating layer are formed.