The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
May. 13, 2016
Globalfoundries Inc., Grand Cayman, KY;
Peter Moll, Dresden, DE;
Martin Schmidt, Moritzburg, DE;
Carsten Hartig, Meerane, DE;
Matthias Ruhm, Dresden, DE;
Stefan Thierbach, Dresden, DE;
Stefan Rongen, Radeburg, DE;
Daniel Fischer, Dresden, DE;
Andreas Schuring, Dresden, DE;
Guido Überreiter, Dresden, DE;
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
Methods for in-die overlay reticle measurement and the resulting devices are disclosed. Embodiments include providing parallel structures in a first layer on a substrate; determining measurement sites, in a second layer above the first layer, void of active integrated circuit elements; forming overlay trenches, in the measurement sites and parallel to the structures, exposing sections of the structures, wherein each overlay trench is aligned over a structure and over spaces between the structure and adjacent structures; determining a trench center-of-gravity of an overlay trench; determining a structure center-of-gravity of a structure exposed in the overlay trench; and determining an overlay parameter based on a difference between the trench center-of-gravity and the structure center-of-gravity.