The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Mar. 27, 2014
Tokyo Electron Limited, Tokyo, JP;
Masayuki Hirose, Yamanashi, JP;
Shigeyuki Okura, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A source gas supply unit includes a carrier gas supply unit for supplying a carrier gas into a raw material tank, and a control unit. The control unit executes steps of: supplying the carrier gas to the raw material tank while varying a flow rate of the carrier gas without forming a film on a substrate, and storing a vaporization flow rate table showing the correspondence between a vaporization flow rate of the vaporized raw material contained in a source gas and a carrier gas flow rate set value; obtaining a carrier gas flow rate set value corresponding to a specified vaporization flow rate set value by using the vaporization flow rate table; and generating the source gas by supplying the carrier gas into the raw material tank based on the obtained carrier gas flow rate set value and supplying the generated source gas to a film forming unit.