The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Apr. 25, 2016
Applied Materials, Inc., Santa Clara, CA (US);
Dale R. Dubois, Los Gatos, CA (US);
Kalyanjit Ghosh, San Jose, CA (US);
Kien N. Chuc, Cupertino, CA (US);
Mayur G. Kulkarni, Sunnyvale, CA (US);
Sanjeev Baluja, Campbell, CA (US);
Yanjie Wang, Santa Clara, CA (US);
Sungjin Kim, Palo Alto, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
A process chamber is provided including a sidewall, a substrate support having an outer ledge, and a gas inlet beneath the substrate support. The process chamber further includes a first liner disposed around a bottom surface of the outer ledge of the substrate support. The first liner has an inner surface separated from the outer ledge of the substrate support by a first gap. The process chamber further includes a flow isolator ring having an inner bottom surface disposed on the outer ledge of the substrate support and an outer bottom surface extending outwardly relative to the inner bottom surface, the outer bottom surface overlying the first gap.