The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
May. 09, 2017
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventors:
Jerome A. Imonigie, Boise, ID (US);
Prashant Raghu, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); H01L 21/311 (2006.01); C09K 13/00 (2006.01); C09K 13/04 (2006.01); C09K 13/06 (2006.01); H01L 21/28 (2006.01); H01L 27/11556 (2017.01); H01L 21/3213 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); C09K 13/00 (2013.01); C09K 13/04 (2013.01); C09K 13/06 (2013.01); H01L 21/28273 (2013.01); H01L 21/30604 (2013.01); H01L 21/31111 (2013.01); H01L 21/32134 (2013.01); H01L 27/11556 (2013.01);
Abstract
Methods include exposing polysilicon to an aqueous composition comprising nitric acid, poly-carboxylic acid and ammonium fluoride, and removing a portion of the polysilicon selective to an oxide using the aqueous composition.