The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
May. 07, 2015
Applicant:
Lintec Corporation, Tokyo, JP;
Inventors:
Masami Matsui, Tokyo, JP;
Mikihiro Kashio, Tokyo, JP;
Assignee:
LINTEC CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/14 (2006.01); C08G 77/16 (2006.01); C09J 183/06 (2006.01); C08K 5/54 (2006.01); C08G 77/08 (2006.01); C08L 83/04 (2006.01); H01L 23/29 (2006.01); H01L 23/31 (2006.01); H01L 21/52 (2006.01); H01L 33/56 (2010.01); C08G 77/06 (2006.01); C08K 5/5435 (2006.01); C08K 5/5455 (2006.01);
U.S. Cl.
CPC ...
C08G 77/14 (2013.01); C08G 77/06 (2013.01); C08G 77/08 (2013.01); C08G 77/16 (2013.01); C08K 5/54 (2013.01); C08K 5/5435 (2013.01); C08K 5/5455 (2013.01); C08L 83/04 (2013.01); C09J 183/06 (2013.01); H01L 21/52 (2013.01); H01L 23/29 (2013.01); H01L 23/296 (2013.01); H01L 23/31 (2013.01); H01L 33/56 (2013.01); H01L 2924/0002 (2013.01);
Abstract
The present invention is a curable polysilsesquioxane compound comprising one structural unit or two or more structural units represented by RSiO, the curable polysilsesquioxane compound having aSi nuclear magnetic resonance spectrum that has a first peak top within a range of −60 ppm or more and less than −54 ppm, has a second peak top within a range of −70 ppm or more and less than −61 ppm, and substantially does not have a peak within a range of −53 ppm or more and less than −45 ppm, and