The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Mar. 19, 2013
Shibaura Mechatronics Corporation, Yokohama-shi, JP;
Takeharu Motokawa, Kanagawa-ken, JP;
Tokuhisa Ooiwa, Kanagawa-ken, JP;
Kensuke Demura, Kanagawa-ken, JP;
Tomoaki Yoshimori, Kanagawa-ken, JP;
Makoto Karyu, Kanagawa-ken, JP;
Yoshihisa Kase, Kanagawa-ken, JP;
Hidehito Azumano, Kanagawa-ken, JP;
SHIBAURA MECHATRONICS CORPORATION, Yokohama-shi, JP;
Abstract
According to one embodiment, a plasma processing apparatus includes: a processing chamber; a decompression section configured to decompress inside of the processing chamber; a member including a control section to be inserted into a depression provided on mounting side of a workpiece, the control section being configured to thereby control at least one of in-plane distribution of capacitance of a region including the workpiece and in-plane distribution of temperature of the workpiece; a mounting section provided inside the processing chamber; a plasma generating section configured to supply electromagnetic energy to a region for generating a plasma for performing plasma processing on the workpiece; and a gas supply section configured to supply a process gas to the region for generating a plasma. The control section performs control so that at least one of the in-plane distribution of capacitance and the in-plane distribution of temperature is made uniform.