The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2018

Filed:

Nov. 07, 2017
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Takaharu Konomi, Kumamoto, JP;

Kazunori Inoue, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/136 (2006.01); H01L 27/12 (2006.01); H01L 29/786 (2006.01); G02F 1/1368 (2006.01); H01L 29/66 (2006.01); G02F 1/1362 (2006.01);
U.S. Cl.
CPC ...
H01L 27/124 (2013.01); G02F 1/1368 (2013.01); G02F 1/136227 (2013.01); G02F 1/136286 (2013.01); H01L 27/1225 (2013.01); H01L 29/66969 (2013.01); H01L 29/7869 (2013.01); H01L 29/78696 (2013.01); G02F 2001/13629 (2013.01); G02F 2201/123 (2013.01);
Abstract

It is an object to provide a technique capable of suppressing a damage on a semiconductor channel layer due to a process of forming a source electrode and a drain electrode and also suppressing a short channel effect. A thin film transistor includes a gate electrode, a first insulating film, a source electrode, a drain electrode, a second insulating film, and a semiconductor channel layer that includes an oxide semiconductor. The second insulating film is disposed on the first insulating film, the source electrode, and the drain electrode. The semiconductor channel layer is electrically connected to the source electrode and the drain electrode via a first contact hole and a second contact hole provided in the second insulating film.


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