The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Dec. 18, 2014
Applicant:
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Inventors:
Steven M. Anella, West Newbury, MA (US);
Michael A. Schrameyer, Beverly, MA (US);
Assignee:
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/324 (2006.01); H01L 21/683 (2006.01); H05B 3/00 (2006.01); H01L 21/687 (2006.01); H05B 3/26 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67103 (2013.01); H01L 21/324 (2013.01); H01L 21/67109 (2013.01); H01L 21/67248 (2013.01); H01L 21/683 (2013.01); H01L 21/68735 (2013.01); H05B 3/0047 (2013.01); H05B 3/265 (2013.01); H05B 2203/014 (2013.01);
Abstract
An apparatus and method for improving the temperature uniformity of a workpiece during processing is disclosed. The apparatus includes a ring heater assembly disposed along the outer circumference of the platen. The ring heater assembly includes heating elements disposed therein or thereon, where these heating elements create heat, which serves to warm the outer edge of the workpiece. In some embodiments, the ring heater assembly extends beyond the edge of the workpiece and may be exposed to the ion beam.