The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
May. 12, 2015
Applicant:
Mitsui Chemicals, Inc., Minato-ku, Tokyo, JP;
Inventors:
Yosuke Ono, Sodegaura, JP;
Kazuo Kohmura, Chiba, JP;
Assignee:
MITSUI CHEMICALS, INC., Minato-Ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/64 (2012.01); G03F 1/62 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/64 (2013.01); G03F 1/62 (2013.01); G03F 7/2004 (2013.01);
Abstract
A pellicle membrane includes a film consisting of an organic material and an inorganic material, wherein a region containing an organic material and a region consisting of an inorganic material are present in the same plane of the film, and wherein at least a central portion of the film is a region consisting of an inorganic material, and at least a peripheral edge portion of the film is a region containing an organic material.
Ono, Yosuke. (2018). Pellicle membrane, pellicle, original plate for exposure, exposure apparatus, and method of producing semiconductor device (U.S. Patent No. 10108084). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10108084
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile