The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Mar. 16, 2014
Nanonex Corporation, Monmouth Junction, NJ (US);
Hua Tan, Princeton Junction, NJ (US);
Lin Hu, Livingston, NJ (US);
Wei Zhang, Newton, PA (US);
Stephen Y. Chou, Princeton, NJ (US);
NANONEX CORPORATION, Monmouth Junction, NJ (US);
Abstract
A nanoimprint lithography system and method for manufacturing substrates with nano-scale patterns, having a process chamber with transparent sections on both top and side walls, a robot for automatic molds and substrates loading and unloading, and optical and stage apparatuses to obtain the desired spatial relationship between the mold and substrate, with an enclosed volume referring to mold mini-chamber being formed between the mold/holder and top wall of the chamber and with the process chamber and mini-chamber being capable of both vacuuming and pressurizing, and inside the chamber, a ring shape seal assembly is installed and a mold support assembly can be installed that aids in imprinting all the way to the edge of the substrate with various embodiments for carrying out fluid pressure imprinting, separation, measurement and control of mold and substrate gap, substrate thickness, and system axial force.