The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2018

Filed:

Jan. 29, 2015
Applicant:

Hewlett Packard Enterprise Development Lp, Houston, TX (US);

Inventors:

Jianhua Yang, Palo Alto, CA (US);

Ning Ge, Palo Alto, CA (US);

Katy Samuels, Palo Alto, CA (US);

Minxian Max Zhang, Mountain View, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/24 (2006.01); G11C 13/00 (2006.01); H01L 45/00 (2006.01); G11C 11/16 (2006.01);
U.S. Cl.
CPC ...
H01L 27/2418 (2013.01); G11C 11/1659 (2013.01); G11C 13/004 (2013.01); G11C 13/0007 (2013.01); G11C 13/0069 (2013.01); H01L 27/2409 (2013.01); H01L 27/2463 (2013.01); H01L 45/08 (2013.01); H01L 45/085 (2013.01); H01L 45/1233 (2013.01); H01L 45/1253 (2013.01); H01L 45/145 (2013.01); H01L 45/146 (2013.01); H01L 45/16 (2013.01); H01L 45/1625 (2013.01); G11C 2213/32 (2013.01); G11C 2213/34 (2013.01); G11C 2213/76 (2013.01);
Abstract

A resistive memory device includes a first electrode, a memristor coupled in electrical series with the first electrode, a second electrode coupled in electrical series with the memristor, a selector coupled in electrical series with the second electrode, and a third electrode coupled in electrical series with the selector. The memristor includes oxygen or nitrogen elements. The selector includes a composite dielectric material of a first dielectric material, a second dielectric material that is different from the first dielectric material, and a dopant material including a cation having a migration rate faster than the oxygen or the nitrogen elements of the memristor. The first dielectric material and the second dielectric material are present in a ratio ranging from 1:9 to 9:1, and a concentration of the dopant material in the composite dielectric material ranges from about 1% up to 50%.


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