The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2018
Filed:
Apr. 01, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Marinus Maria Johannes Van De Wal, Oirschot, NL;
Wilhelmus Henricus Theodorus Maria Aangenent, Eindhoven, NL;
Jeroen Johannes Theodorus Hendrikus De Best, Druten, NL;
Jan Van Eijk, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70775 (2013.01);
Abstract
A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M>N. A transformation module converts the M measurements by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.
Van De Wal, Marinus Maria Johannes. (2018). Control system, positioning system, lithographic apparatus, control method, device manufacturing method and control program (U.S. Patent No. 10095123). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10095123
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile