The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2018
Filed:
Oct. 23, 2013
Asml Netherlands B.v., Veldhoven, NL;
Hendrikus Gijsbertus Schimmel, Utrecht, NL;
Michel Riepen, Veldhoven, NL;
Reinier Theodorus Martinus Jilisen, Eindhoven, NL;
Dennis De Graaf, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma () generated from a fuel () within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((), ()). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces () by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.