The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2018

Filed:

May. 01, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Binquan Luan, Chappaqua, NY (US);

Gustavo A. Stolovitzky, Riverdale, NY (US);

Chao Wang, Ossining, NY (US);

Deqiang Wang, Ossining, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/10 (2006.01); G01N 27/447 (2006.01); G01N 33/487 (2006.01); C12Q 1/6869 (2018.01);
U.S. Cl.
CPC ...
G01N 27/44791 (2013.01); C12Q 1/6869 (2013.01); G01N 33/48721 (2013.01);
Abstract

Techniques for increasing the capture zone in nano and microchannel-based polymer testing structures using concentric arrangements of nanostructures, such as nanopillars are provided. In one aspect, a testing structure for testing polymers is provided that includes a first fluid reservoir and a second fluid reservoir formed in an electrically insulating substrate; at least one channel formed in the insulating substrate that interconnects the first fluid reservoir and the second fluid reservoir; and an arrangement of nanostructures within either the first fluid reservoir or the second fluid reservoir wherein the nanostructures are arranged so as to form multiple concentric circles inside either the first fluid reservoir or the second fluid reservoir with each of the concentric circles being centered at an entry point of the channel. A method of analyzing a polymer using the testing structure is also provided.


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