The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2018

Filed:

Dec. 05, 2016
Applicant:

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Chia-Liang Yeh, Hsinchu, TW;

Yi-Chang Chen, Hsinchu, TW;

Yi-Sha Ku, Hsinchu, TW;

Chun-Wei Lo, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/30 (2006.01); G01N 21/47 (2006.01); G01B 11/24 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 21/4788 (2013.01); G01B 11/24 (2013.01); G01N 21/4785 (2013.01); G01N 21/4795 (2013.01); H01L 22/00 (2013.01); G01B 2210/56 (2013.01); G01N 2201/068 (2013.01);
Abstract

A scattering measurement system is provided, including: a light source generator for generating a detection light beam with discontinuous multi-wavelengths, and generating a multi-order diffraction light beam with three-dimensional feature information when the detection light beam is incident on an object; a detector having a photosensitive array for receiving and converting the multi-order diffraction light beam into multi-order diffraction signals with the three-dimensional feature information; and a processing module for receiving the multi-order diffraction signals and comparing the multi-order diffraction signals with multi-order diffraction feature patterns in a database so as to analyze the three-dimensional feature information of the object.


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