The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2018
Filed:
Dec. 15, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Akinori Nishimura, Annaka, JP;
Toru Shirasaki, Annaka, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/64 (2012.01); G03F 1/62 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/64 (2013.01); G03F 1/62 (2013.01); G03F 7/2004 (2013.01);
Abstract
There is provided a pellicle for EUV lithography, which has a filter attached to a vent hole made through a pellicle frame bar for air pressure adjustment, and this filter is designed to be heat-resistant by being made of either a metal or a ceramic material, and is adhered to the pellicle frame by weldering or soldering, and also the filter has a filtration accuracy of 0.1 through 0.3 μm.