The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 2018

Filed:

Mar. 08, 2013
Applicant:

Ecolab Usa Inc., St. Paul, MN (US);

Inventors:

Jane B. Wong Shing, Aurora, IL (US);

Zhi Chen, Shanghai, CN;

Dennis MacDonald, Wheaton, IL (US);

Ronald S. Doles, LaGrange Park, IL (US);

Wen Bai, Shanghai, CN;

Raymond D. Miller, Jr., Carol Stream, IL (US);

Assignee:

ECOLAB USA INC., Naperville, IL (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D21H 17/68 (2006.01); D21H 21/10 (2006.01); C01B 33/148 (2006.01);
U.S. Cl.
CPC ...
C01B 33/148 (2013.01); D21H 17/68 (2013.01); D21H 21/10 (2013.01); C01P 2006/12 (2013.01);
Abstract

The invention provides a method for improving the effectiveness of colloidal silica. The method involves removing enough charged impurities from the colloid to prevent the charged particles from causing the colloid to become a viscous gel. The method however also involves not removing too many charged particles so the silica material doesn't gel by cross-linking with itself. This method is quite effective because it recognizes that materials that have accumulated during the formation of the colloid do perform an important function, but they can perform better at a lower concentration.


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