The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 2018

Filed:

Nov. 22, 2017
Applicant:

Infineon Technologies Americas Corp., El Segundo, CA (US);

Inventor:

Michael A. Briere, Scottsdale, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/20 (2006.01); H01L 21/02 (2006.01); H01L 29/15 (2006.01); H01L 29/207 (2006.01); H01L 29/778 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/2003 (2013.01); H01L 21/0251 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02389 (2013.01); H01L 21/02458 (2013.01); H01L 21/02505 (2013.01); H01L 21/02584 (2013.01); H01L 29/157 (2013.01); H01L 29/207 (2013.01); H01L 29/66462 (2013.01); H01L 29/7787 (2013.01);
Abstract

A semiconductor structure includes a substrate, a transition body over the substrate, a group III-V intermediate body having a bottom surface over the transition body and a group III-V device layer over a top surface of the group III-V intermediate body. The group III-V intermediate body has a first impurity concentration at the bottom surface, a second impurity concentration at the top surface, and a variable impurity concentration that rises and falls between the bottom surface and the top surface. The first impurity concentration is greater than the second impurity concentration.


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