The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
Jan. 25, 2016
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Itaru Kanno, Tokyo, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6708 (2013.01); H01L 21/02052 (2013.01); H01L 21/02057 (2013.01); H01L 21/67051 (2013.01); H01L 21/67253 (2013.01); H01L 21/67115 (2013.01); H01L 22/12 (2013.01);
Abstract
Provided is a substrate processing apparatus, in which a processing liquid is supplied to a substrate W held horizontally by a substrate holding unit. A processing liquid passing portion includes a passing surface that is provided between the substrate W and a recovery cup provided around the substrate W such that the processing liquid flows on the passing surface. Light for concentration detection is projected from a light projection unit to the passing surface, and a concentration detection unit detects a concentration of the processing liquid based on a result of receiving the reflected light of the light by a light receiving unit.