The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
Apr. 21, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventor:
Herman Philip Godfried, Amsterdam, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01J 1/58 (2006.01); G01J 1/42 (2006.01);
U.S. Cl.
CPC ...
G01J 1/58 (2013.01); G01J 1/429 (2013.01); G01J 1/4257 (2013.01); G03F 7/7085 (2013.01); G03F 7/70558 (2013.01); G03F 7/70616 (2013.01);
Abstract
A lithographic apparatus including a monitoring apparatus and an associated monitoring apparatus. The monitoring apparatus is configured for monitoring first radiation of a first wavelength. The monitoring apparatus has a first sensor apparatus including a diamond fluorescent material configured to absorb the first radiation and to emit second radiation being representative of the first radiation, the second radiation being of a second wavelength; and a second sensor apparatus configured to sense the second radiation.