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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10081090 B1

PDFFull Text
Date of Patent:
Sep. 25, 2018

Filed:

Mar. 03, 2016

Method of manufacturing an upper electrode of a plasma processing device

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Tsuguo Kitajima, Miyagi, JP;

Yasumasa Ishihara, Miyagi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Rothwell, Figg, Ernst & Manbeck, P.C.

Primary Examiner:

A Dexter Tugbang

Int. Cl.
CPC ...
B24C 1/08 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 8/36 (2006.01); C23C 4/134 (2016.01); B24C 11/00 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
B24C 1/08 (2013.01); B24C 11/00 (2013.01); C23C 4/134 (2016.01); C23C 8/36 (2013.01); C23C 16/45565 (2013.01); C23C 16/45568 (2013.01); H01J 37/32009 (2013.01); H01J 37/32018 (2013.01); H01J 37/3244 (2013.01); H01J 37/32091 (2013.01); H01J 37/32532 (2013.01); H01J 37/32559 (2013.01); H01J 37/32605 (2013.01); H01L 21/31116 (2013.01); Y10T 29/49156 (2015.01); Y10T 29/49204 (2015.01);
Abstract

A method of manufacturing an upper electrode of a plasma processing device includes forming a covering layer having plasma resistance on a surface of a main body portion constituting the upper electrode at a side of the processing space; polishing a surface of the covering layer exposed to the processing space; and after the polishing, blasting the surface of the covering layer polished at the polishing.

Find Patent Forward Citations

Kitajima, Tsuguo. (2018). Method of manufacturing an upper electrode of a plasma processing device (U.S. Patent No. 10081090). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10081090

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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