The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2018
Filed:
Oct. 21, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/40 (2006.01); C07C 69/74 (2006.01); C07C 69/753 (2006.01); C07C 69/757 (2006.01); C07C 69/78 (2006.01); C07C 69/95 (2006.01); C07C 205/06 (2006.01); C07C 205/11 (2006.01); C07C 303/32 (2006.01); C08F 228/02 (2006.01); G03F 7/039 (2006.01); C07C 309/12 (2006.01); C07J 31/00 (2006.01); C07D 307/00 (2006.01); G03F 7/20 (2006.01); C07C 309/04 (2006.01); C07C 309/24 (2006.01); C07C 309/06 (2006.01); C07C 309/20 (2006.01); C07C 309/73 (2006.01); C07J 43/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C07C 69/74 (2013.01); C07C 69/753 (2013.01); C07C 69/757 (2013.01); C07C 69/78 (2013.01); C07C 69/95 (2013.01); C07C 205/06 (2013.01); C07C 205/11 (2013.01); C07C 303/32 (2013.01); C07C 309/04 (2013.01); C07C 309/06 (2013.01); C07C 309/12 (2013.01); C07C 309/20 (2013.01); C07C 309/24 (2013.01); C07C 309/73 (2013.01); C07D 307/00 (2013.01); C07J 31/006 (2013.01); C08F 228/02 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/2037 (2013.01); G03F 7/2059 (2013.01); C07C 2601/02 (2017.05); C07C 2601/04 (2017.05); C07C 2601/08 (2017.05); C07C 2601/14 (2017.05); C07C 2601/18 (2017.05); C07C 2601/20 (2017.05); C07C 2602/08 (2017.05); C07C 2602/10 (2017.05); C07C 2602/24 (2017.05); C07C 2602/28 (2017.05); C07C 2602/42 (2017.05); C07C 2603/16 (2017.05); C07C 2603/18 (2017.05); C07C 2603/24 (2017.05); C07C 2603/50 (2017.05); C07C 2603/68 (2017.05); C07C 2603/74 (2017.05); C07C 2603/86 (2017.05); C07J 43/003 (2013.01);
Abstract
A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.