The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2018

Filed:

Oct. 03, 2016
Applicant:

Sandisk Technologies Llc, Plano, TX (US);

Inventors:

Kiyohiko Sakakibara, Yokkaichi, JP;

Yusuke Ikawa, Yokkaichi, JP;

Assignee:

SANDISK TECHNOLOGIES LLC, Addison, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 27/115 (2017.01); H01L 29/423 (2006.01); H01L 29/04 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/06 (2006.01); G11C 16/04 (2006.01); H01L 27/11556 (2017.01); H01L 27/11582 (2017.01); H01L 27/1157 (2017.01); H01L 27/11524 (2017.01); H01L 29/739 (2006.01); H01L 29/868 (2006.01);
U.S. Cl.
CPC ...
H01L 27/115 (2013.01); G11C 16/0483 (2013.01); H01L 21/28273 (2013.01); H01L 21/28282 (2013.01); H01L 27/1157 (2013.01); H01L 27/11556 (2013.01); H01L 27/11582 (2013.01); H01L 29/04 (2013.01); H01L 29/0688 (2013.01); H01L 29/0847 (2013.01); H01L 29/1037 (2013.01); H01L 29/42328 (2013.01); H01L 29/42344 (2013.01); H01L 27/11524 (2013.01); H01L 29/7391 (2013.01); H01L 29/868 (2013.01);
Abstract

Data stored in a plurality of charge storage elements in a three-dimensional memory device can be read with high speed by measuring a majority charge carrier current passing through a vertical semiconductor channel. A memory film is provided in a memory opening extending through an alternating stack of insulating layers and electrically conductive layers. A set of doped semiconductor material regions having a doping of a first conductivity type can collectively extend continuously from underneath a top surface of a substrate through the memory film to a level of a topmost layer of the alternating stack. A well contact via structure can contact a doped contact region, which is an element of the set of doped semiconductor material regions. A p-n junction is provided within each memory opening between the doped vertical semiconductor channel and an upper doped semiconductor region having a doping of a second conductivity type.


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