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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10074550 B1

PDFFull Text
Date of Patent:
Sep. 11, 2018

Filed:

Jul. 07, 2015

Plasma stability determination method and plasma processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Ryo Miyama, Miyagi, JP;

Naoto Watanabe, Miyagi, JP;

Koichiro Nakamura, Miyagi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Rothwell, Figg, Ernst & Manbeck, P.C.

Primary Examiner:

Julio J Maldonado

Assistant Examiner:

Andre′ C Stevenson

Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/67 (2006.01); H01L 21/66 (2006.01); H01L 21/3065 (2006.01); H05H 1/00 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01); H01L 22/10 (2013.01); H05H 1/0025 (2013.01); H05H 1/46 (2013.01); H05H 2001/463 (2013.01);
Abstract

A method and apparatus for determining a stability of plasma in a plasma processing apparatus for performing a plasma processing by converting into plasma a processing gas supplied into a processing container. The method includes: detecting a light emission intensity of the plasma in the processing container while the plasma is generated in the processing container; generating a first function representing a relationship between time and the light emission intensity from a detection result of the light emission intensity; differentiating the first function with time to calculate a differential value, and generating a second function from a relationship between an absolute value of the differential value and time; and integrating the second function with time to calculate an integral value, and determining a stability of the plasma based on the calculated integral value. A related apparatus is also provided.

Find Patent Forward Citations

Miyama, Ryo. (2018). Plasma stability determination method and plasma processing apparatus (U.S. Patent No. 10074550). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10074550

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