The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2018

Filed:

Nov. 18, 2016
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Saibal Banerjee, Fremont, CA (US);

Ashok Kulkarni, San Jose, CA (US);

Shaoyu Lu, San Jose, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06T 7/0081 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Noise induced by pattern-of-interest (POI) image registration and POI vicinity design patterns in intra-die inspection is reduced. POI are grouped into alignment groups by co-occurrence of proximate registration targets. The alignment groups are registered using the co-occurrence of proximate registration targets. Registration by voting is performed, which can measure a degree that each of the patterns-of-interest is an outlier. POI are grouped into at least one vicinity group with same vicinity design effects.


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