The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2018

Filed:

Apr. 01, 2016
Applicant:

Freescale Semiconductor, Inc., Austin, TX (US);

Inventors:

Viacheslav Kalashnikov, Zelenograd, RU;

Denis Malashevich, Zelenograd, RU;

Mikhail Semenov, Zelenograd, RU;

Assignee:

NXP USA, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G06F 17/5072 (2013.01); G06F 17/5077 (2013.01); G06F 2217/02 (2013.01); G06F 2217/08 (2013.01);
Abstract

This disclosure describes a library optimization system that creates modified standard cells with reduced leakage currents that meet predefined cell area, timing, and leakage requirements. The library optimization system selects transistors to upsize based upon the fact that transistors of a same type, such as p-channel or n-channel transistors, that are connected in series produce a small reverse bias between the gate and source, known as a stacking effect. The stacking effect results in an inherent decrease in leakage current for the series-connected transistor chain. As such, the library optimization system adjusts gate lengths of transistors that are not part of the transistor series chains having a relatively large amount of same type transistors.


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