The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2018
Filed:
Jul. 07, 2016
Applicant:
Tokyo Electron Limited, Minato-ku, JP;
Inventors:
Junjun Liu, Austin, TX (US);
Eric M. Lee, Austin, TX (US);
Dorel I. Toma, Dripping Springs, TX (US);
Assignee:
Tokyo Electron Limited, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); B05D 3/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02348 (2013.01); B05D 3/062 (2013.01); H01L 21/67034 (2013.01); H01L 21/67115 (2013.01); H01L 21/67207 (2013.01);
Abstract
A multi-step system and method for curing a dielectric film in which the system includes a drying system configured to reduce the amount of contaminants, such as moisture, in the dielectric film. The system further includes a curing system coupled to the drying system, and configured to treat the dielectric film with ultraviolet (UV) radiation and infrared (IR) radiation in order to cure the dielectric film.