The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2018
Filed:
Oct. 28, 2014
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Jozef Brcka, Austin, TX (US);
Osayuki Akiyama, Rensselaer, NY (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); C23C 16/44 (2006.01); C23C 16/46 (2006.01); C23C 16/503 (2006.01); C23C 16/52 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); B08B 7/0035 (2013.01); C23C 16/46 (2013.01); C23C 16/503 (2013.01); C23C 16/52 (2013.01); H01J 37/32091 (2013.01); H01J 37/32165 (2013.01); H01J 37/32449 (2013.01); H01J 37/32862 (2013.01); H01J 37/32889 (2013.01);
Abstract
A method of operating a filament assisted chemical vapor deposition (FACVD) system. The method includes depositing a film on a substrate in a reactor of the FACVD system. During the depositing, a DC power is supplied to a heater assembly to thermally decompose a film forming material. The method also includes cleaning the heater assembly, or an interior surface of the reactor, or both. During the cleaning, an alternating current is supplied to the heater assembly to energize a cleaning media into a plasma.