The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2018

Filed:

Aug. 22, 2017
Applicant:

Cypress Semiconductor Corporation, San Jose, CA (US);

Inventors:

Krishnaswamy Ramkumar, San Jose, CA (US);

Igor Kouznetsov, San Francisco, CA (US);

Venkatraman Prabhakar, Pleasanton, CA (US);

Ali Keshavarzi, Los Altos, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 29/66 (2006.01); H01L 29/792 (2006.01); H01L 27/11568 (2017.01); H01L 27/11573 (2017.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28282 (2013.01); H01L 21/0223 (2013.01); H01L 21/02301 (2013.01); H01L 27/11568 (2013.01); H01L 27/11573 (2013.01); H01L 29/66833 (2013.01); H01L 29/792 (2013.01);
Abstract

A method to integrate silicon-oxide-nitride-oxide-silicon (SONOS) transistors into a complementary metal-oxide-semiconductor (CMOS) flow including a triple gate oxide structure. The memory device may include a non-volatile memory (NVM) transistor that has a charge-trapping layer and a blocking dielectric, a first field-effect transistor (FET) including a first gate oxide of a first thickness, a second FET including a second gate oxide of a second thickness, a third FET including a third gate oxide of a third thickness, in which the first thickness is greater than the second thickness and the second thickness is greater than the third thickness.


Find Patent Forward Citations

Loading…