The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2018

Filed:

May. 14, 2013
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Noriyuki Lee, Tokyo, JP;

Hiroyuki Yamamoto, Tokyo, JP;

Akira Sugawara, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 37/00 (2006.01); H01J 37/305 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3056 (2013.01); H01J 37/317 (2013.01); H01J 2237/31749 (2013.01);
Abstract

To realize a focused-ion-beam machining apparatus capable of machining a thin sample with a wide area and a uniform film thickness and a needle-like sample with a sharp tip, in a focused-ion-beam machining apparatus including: an ion source (); an electronic lens () focusing an ion beam extracted from the ion source () and irradiating the ion beam to a sample (); and a sample holder () holding the sample (), the sample holder () is provided with a shield electrode () arranged in a manner such as to cover the sample (), and the sample () and the shield electrode () are insulated from each other in a manner such that voltages can be applied to them separately from each other.


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