The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2018

Filed:

Nov. 16, 2017
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Boris Bittner, Roth, DE;

Norbert Wabra, Werneck, DE;

Sonja Schneider, Oberkochen, DE;

Ricarda Schoemer, Zusmarshausen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G03F 7/20 (2006.01); G02B 13/14 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70266 (2013.01); G02B 13/143 (2013.01); G02B 27/0068 (2013.01); G03F 7/70308 (2013.01);
Abstract

A projection lens images a pattern of a mask arranged in the region of an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation with a work wavelength λ<260 nm. The projection lens has a multiplicity of optical elements with optical surfaces. The projection lens also has a wavefront manipulation system for controllable influencing of the wavefront of the projection radiation travelling from the object plane to the image plane. The wavefront manipulation system has a manipulator having a manipulator element and an actuating device or reversibly changing an optical effect of the manipulator element on radiation of the projection beam path.


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