logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10061195 B1

PDFFull Text
Expired
Date of Patent:
Aug. 28, 2018

Filed:

Mar. 30, 2016

Photosensitive resin composition for dry etching, and method for producing resist pattern for dry etching

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Teruhiro Uematsu, Kawasaki, JP;

Kiminori Oshio, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

Kathleen Duda

Int. Cl.
CPC ...
G03F 7/30 (2006.01); G03F 7/028 (2006.01); G03F 7/32 (2006.01); G03F 7/032 (2006.01); G03F 7/033 (2006.01);
U.S. Cl.
CPC ...
G03F 7/028 (2013.01); G03F 7/033 (2013.01); G03F 7/0325 (2013.01); G03F 7/30 (2013.01); G03F 7/32 (2013.01);
Abstract

A photosensitive resin composition for dry etching including a water-soluble resin, a photopolymerizable monomer, and a photopolymerization initiator, and a method for producing a resist pattern for dry etching. The method includes forming a resin layer with the photosensitive resin composition on a substrate; exposing the resin layer with positional selectivity; and developing the exposed resin layer with water at a temperature less than 50° C., so as to form a resist pattern.

Find Patent Forward Citations

Quick Actions:

Uematsu, Teruhiro. (2018). Photosensitive resin composition for dry etching, and method for producing resist pattern for dry etching (U.S. Patent No. 10061195). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10061195

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…