The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2018
Filed:
Feb. 13, 2017
Applicant:
Gigaphoton Inc., Tochigi, JP;
Inventors:
Assignee:
GIGAPHOTON INC., Tochigi, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); H01L 21/027 (2006.01); H05H 1/24 (2006.01); H01S 3/10 (2006.01); H05H 15/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); G03F 7/70033 (2013.01); H01L 21/027 (2013.01); H01S 3/10061 (2013.01); H05G 2/003 (2013.01); H05G 2/006 (2013.01); H05H 1/24 (2013.01); H05H 15/00 (2013.01);
Abstract
An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.