The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2018
Filed:
Oct. 28, 2015
Tokyo Electron Limited, Tokyo, JP;
Junya Minamida, Koshi, JP;
Shogo Kiyama, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
Gas-liquid separation of an exhaust gas from a liquid processing unit can be improved. A substrate liquid processing apparatus includes a liquid processing unit, a first exhaust pipe and a second exhaust pipe. The liquid processing unit is configured to process a substrate with a processing liquid. At least a part of the first exhaust pipe at is located above the liquid processing unit. One end of the second exhaust pipe is connected to the liquid processing unit, and the second exhaust pipe is configured to evacuate the liquid processing unit through the first exhaust pipe by an exhaust device. Further, the other end of the second exhaust pipe is connected to a portion of the first exhaust pipe which is located above the liquid processing unit.