The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2018
Filed:
Jul. 01, 2013
Tokyo Electron Limted, Tokyo, JP;
Nobuyuki Nagayama, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes a lower electrodeon which a wafer W is provided. A second coolant pathis formed in a spiral shape in a region within the lower electrodecorresponding to where the wafer W is placed. Further, a first coolant pathis formed in a spiral shape to be located in a lower region within the lower electrodecorresponding to where the second coolant pathis formed. A pipelineconnected to a chiller unitis branched into a first pipelineconnected to the first coolant pathand a second pipelineconnected to the second coolant path. A check valveallowing a coolant to flow in one direction is provided on the first pipeline, and a reversing unitreversing a flow direction of the coolant is provided on the pipeline