The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2018
Filed:
Mar. 20, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jesse Quinn Odle, San Diego, CA (US);
Jason Michael Arcand, Escondido, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/21 (2006.01); G01N 21/55 (2014.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/55 (2013.01); G01N 21/21 (2013.01); H05G 2/008 (2013.01); G01N 2201/068 (2013.01); G01N 2201/0691 (2013.01); G01N 2201/0697 (2013.01); G01N 2201/06113 (2013.01);
Abstract
A system for an EUV light source includes a metrology light source configured to emit a metrology light beam; and an optical beam combiner positioned to receive the metrology light beam and at least one other light beam and to direct the metrology light beam and the at least one other light beam onto a beam path toward a target region. After interacting with the optical beam combiner, the metrology light beam and the at least one other light beam have the same polarization state.