The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2018
Filed:
Aug. 27, 2012
Applicants:
Wei-cheng Chen, Kaohsiung, TW;
Ling-sung Wang, Tainan, TW;
Chih-hsun Lin, Tainan, TW;
Tzu Kai Lin, Tainan, TW;
Inventors:
Wei-Cheng Chen, Kaohsiung, TW;
Ling-Sung Wang, Tainan, TW;
Chih-Hsun Lin, Tainan, TW;
Tzu kai Lin, Tainan, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); C11D 11/00 (2006.01); C11D 7/26 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02052 (2013.01); C11D 7/261 (2013.01); C11D 11/0047 (2013.01); H01L 21/67028 (2013.01);
Abstract
A method of cleaning and drying a semiconductor wafer including inserting a semiconductor wafer into a chamber of a cleaning tool, spinning the semiconductor wafer in a range of about 300 revolutions per minute to about 1600 revolutions per minute, and simultaneously spraying the semiconductor wafer with de-ionized water and a mixture of isopropyl alcohol and nitrogen.