The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2018
Filed:
Nov. 02, 2016
Applicant:
Nuflare Technology, Inc., Yokohama-shi, JP;
Inventor:
Tsubasa Nanao, Yokohama, JP;
Assignee:
NuFlare Technology, Inc., Yokohama-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01J 37/30 (2006.01); H01J 37/304 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2059 (2013.01); H01J 37/304 (2013.01); H01J 37/3177 (2013.01);
Abstract
In one embodiment, a method of aperture alignment for a multi charged particle beam writing apparatus includes irradiating a shaping aperture member with a charged particle beam while changing an incident direction, detecting a current for each of the incident directions of the charged particle beam, producing a current distribution map based on the incident direction and the current, and moving the shaping aperture member or a blanking aperture member based on the current distribution map to align the shaping aperture member with the blanking aperture member.