The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2018
Filed:
Aug. 11, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Erik Willem Bogaart, Someren, NL;
Chuangxin Zhao, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/22 (2006.01); G01N 27/00 (2006.01); G03F 7/20 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/20 (2013.01); G01N 27/22 (2013.01); G03F 7/70033 (2013.01); G03F 7/7085 (2013.01); H05G 2/001 (2013.01);
Abstract
Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.
Bogaart, Erik. (2018). Device for monitoring a radiation source, radiation source, method of monitoring a radiation source, device manufacturing method (U.S. Patent No. 10042260). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10042260
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile