The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2018

Filed:

Feb. 23, 2015
Applicant:

Nova Measuring Instruments Ltd., Rehovot, IL;

Inventors:

Gilad Barak, Rehovot, IL;

Dror Shafir, Kiryat Ono, IL;

Danny Grossman, Herzliya, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01); G01J 9/00 (2006.01); G01J 9/02 (2006.01); G01B 11/02 (2006.01); G01N 21/956 (2006.01); G01N 21/95 (2006.01); G01N 21/21 (2006.01);
U.S. Cl.
CPC ...
G01J 9/00 (2013.01); G01B 11/02 (2013.01); G01J 9/02 (2013.01); G01N 21/21 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G01B 2210/56 (2013.01); G01N 2201/12 (2013.01);
Abstract

A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.


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