The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2018
Filed:
Sep. 12, 2016
Cymer, Llc, San Diego, CA (US);
Tanuj Aggarwal, San Diego, CA (US);
Cymer, LLC, San Diego, CA (US);
Abstract
An indication of an output of an optical source of a photolithography system is accessed; an indication of an input provided to the optical source is accessed, the provided input being associated with the accessed indication of the output of the optical source; an output error is determined from an expected amount of output and the accessed indication of the output of the optical source; a local gain associated with the accessed indication of the input provided to the optical source is estimated; a gain error is determined from the estimated local gain and an expected local gain; a current value of one or more operating metrics of the optical source is estimated based on one or more of the output error and the gain error; and a gain relationship for the optical source is updated based on the estimated current value of the one or more operating metrics.