The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10036962 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 31, 2018

Filed:

Nov. 20, 2014
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventor:

Richard Quintanilha, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03F 7/20 (2006.01); G01B 11/06 (2006.01); G01B 11/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70516 (2013.01); G01B 11/06 (2013.01); G01B 11/14 (2013.01); G03F 7/70625 (2013.01);
Abstract

A scatterometer is used to measure a property of structures on a substrate. A target grating comprises lines arranged periodically over an distance gin a first direction, each line individually extending a distance gL in a second direction. The grating is illuminated with a spot of radiation and diffracted radiation is detected and used to calculate a measurement of CD, side wall angle and the like. The spot defines a field of view customized to the grating such that an extent fof the spot in said first direction is greater than distance gwhile an extent fof the spot in said second direction is less than distance g- The grating may be smaller than conventional gratings. The calculation can be simplified and made more robust, using a mathematical model that assumes that the grating is finite in the first direction but infinite in the second direction.


Find Patent Forward Citations

Quintanilha, Richard. (2018). Inspection apparatus and methods, lithographic system and device manufacturing method (U.S. Patent No. 10036962). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10036962

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…