The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
May. 16, 2016
Beijing University of Technology, Beijing, CN;
Jingpin Jiao, Beijing, CN;
Liang Li, Beijing, CN;
Nan Li, Beijing, CN;
Cunfu He, Beijing, CN;
Bin Wu, Beijing, CN;
Beijing University of Technology, Beijing, CN;
Abstract
Embodiments related to a capacitive proximity sensor with a variable spacing electrode structure, which is suited to a non-destructive testing operation, such as the detection of dielectric properties of the polymer materials with a thickness decreases gradually structure. The designed sensor includes a driving electrode, a sensing electrode, a substrate, a guarding electrode and a lead connector. The driving and sensing electrodes include several interdigitated fingers, which are arranged alternately in sequence, based on the characteristic of the thickness decreases gradually structure of the MUT, the width of the electrodes and spacing between two adjacent electrodes in each unit are optimized individually. Namely, under the condition of ensuring penetration depth, the electrode width is made as large as possible to achieve maximum signal strength and detection sensitivity. Compared with the traditional ES-IDE structure capacitive proximity sensor, the newly designed VS-IDE capacitive sensor increases the effective electrode area, which increases the signal strength and measurement sensitivity directly. Besides, the electric field lines of the designed sensor are confined within the thickness gradually changed materials under test mostly as expected simultaneously.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile